DocumentCode
1026027
Title
Analysis of high-frequency thermal noise of enhancement mode MOS field-effect transistors
Author
Shoji, Mamoru
Author_Institution
Bell Telephone Laboratories, Inc., Murry Hill, N. J.
Issue
6
fYear
1966
fDate
6/1/1966 12:00:00 AM
Firstpage
520
Lastpage
524
Abstract
The high-frequency thermal noise in the drain and the gate of an enhancement mode MOS field-effect transistor was analyzed by using the transmission line model of the channel. The analysis gave the mean squared noise current generators of the drain and the gate and their correlation. The correlation coefficient of the drain and the gate noise was zero for zero drain voltage and was 0.395j at saturation. The noise figure of the MOS field-effect transistor was calculated from the result of the analysis. The high-frequency noise characteristics of an MOS field-effect transistor were similar to those of a junction gate field-effect transistor.
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1966.15724
Filename
1474314
Link To Document