DocumentCode :
1026091
Title :
Influence of drain-induced barrier lowering on the dynamic conductance of short-channel MOSFETs
Author :
Ghibaudo, G. ; Cabon, B.
Author_Institution :
ENSERG, Laboratoire de Physique des Composants Ã\xa0 Semiconducteurs, UA-CNRS 840, Grenoble, France
Volume :
22
Issue :
19
fYear :
1986
Firstpage :
1010
Lastpage :
1011
Abstract :
An analysis of the influence of drain-induced barrier lowering (DIBL) on the dynamic conductance of short-channel MOSFETs is presented. A new method of determination of surface state density Nss from the normalised dynamic conductance characteristics is proposed. The method is extended to the case of very short-channel devices to account for DIBL effects.
Keywords :
insulated gate field effect transistors; surface electron states; drain-induced barrier lowering; dynamic conductance; short-channel MOSFETs; surface state density;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19860690
Filename :
4256899
Link To Document :
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