DocumentCode :
1026650
Title :
(Al,Ga)Sb long-wavelength distributed Bragg reflectors
Author :
Tuttle, Gary ; Kavanaugh, Jonathan ; McCalmont, Scott
Author_Institution :
Dept. of Electr. Eng. & Comput. Eng., Iowa State Univ., Ames, IA, USA
Volume :
5
Issue :
12
fYear :
1993
Firstpage :
1376
Lastpage :
1379
Abstract :
The authors have grown long-wavelength distributed Bragg reflectors (DBRs), using alternating layers of the semiconductors AlSb and (Al,Ga)Sb, and measured their properties. The large refractive index ratio available with these materials allows for high-reflectivity mirrors with relative few mirror pairs. A simple 10-period AlSb/GaSb DBR had a maximum reflectivity of over 98% at a wavelength of 1.92 mu m, and a 12-period Al/sub 0.2/Ga/sub 0.8/Sb/AlSb DBR exhibited reflectance greater than 99% at 1.38 mu m. These structures are easily grown by molecular beam epitaxy (MBE) and are suitable for use in surface-normal photonic devices operating at long wavelengths.<>
Keywords :
III-V semiconductors; aluminium compounds; distributed Bragg reflector lasers; gallium compounds; integrated optics; mirrors; molecular beam epitaxial growth; reflectivity; refractive index; semiconductor growth; (Al,Ga)Sb long-wavelength distributed Bragg reflectors; 1.38 micron; 1.92 micron; Al/sub 0.2/Ga/sub 0.8/Sb-AlSb; AlSb-GaSb; alternating semiconductor layers; growth; high-reflectivity mirrors; mirror pairs; molecular beam epitaxy; reflectance; refractive index; surface-normal photonic devices; Distributed Bragg reflectors; Gallium arsenide; Mirrors; Molecular beam epitaxial growth; Optical surface waves; Reflectivity; Refractive index; Surface emitting lasers; Vertical cavity surface emitting lasers; Waveguide lasers;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/68.262546
Filename :
262546
Link To Document :
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