Title :
Magnetic properties of Fe-Al-Si films prepared by a DC triode sputtering method
Author_Institution :
SHARP Corporation, Nara, Japan
fDate :
9/1/1987 12:00:00 AM
Abstract :
The magnetic properties of FeAlSi films prepared using a DC triode sputtering method are studied. The FeAlSi film must be annealed above 500°C in order to improve the magnetic properties. The thermal expansion coefficient of substrates has less influence on the magnetic properties as the film thickness increases. The dependence of the magnetic properties on the film thickness is related to the film structure.
Keywords :
Magnetic films/devices; Annealing; Coercive force; Magnetic films; Magnetic properties; Permeability; Saturation magnetization; Sputtering; Substrates; Temperature; Voltage;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.1987.1065277
