• DocumentCode
    1027003
  • Title

    Magnetic properties of Fe-Al-Si films prepared by a DC triode sputtering method

  • Author

    Minakata, R.

  • Author_Institution
    SHARP Corporation, Nara, Japan
  • Volume
    23
  • Issue
    5
  • fYear
    1987
  • fDate
    9/1/1987 12:00:00 AM
  • Firstpage
    3236
  • Lastpage
    3238
  • Abstract
    The magnetic properties of FeAlSi films prepared using a DC triode sputtering method are studied. The FeAlSi film must be annealed above 500°C in order to improve the magnetic properties. The thermal expansion coefficient of substrates has less influence on the magnetic properties as the film thickness increases. The dependence of the magnetic properties on the film thickness is related to the film structure.
  • Keywords
    Magnetic films/devices; Annealing; Coercive force; Magnetic films; Magnetic properties; Permeability; Saturation magnetization; Sputtering; Substrates; Temperature; Voltage;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1987.1065277
  • Filename
    1065277
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1027003