DocumentCode :
1027100
Title :
Study of the dynamic resistance of amorphous alloys during the structural relaxation processes
Author :
Jiang, En-Yong ; Lu, Qi ; Li, Jian-Ling
Author_Institution :
University of Tianjin, Tianjin, P.R. China
Volume :
23
Issue :
5
fYear :
1987
fDate :
9/1/1987 12:00:00 AM
Firstpage :
2144
Lastpage :
2145
Abstract :
The effects of the annealing treatment on the temperature coefficient of electrical resistivity of amorphous Fe80.5W5B14.5and Fe41Ni39P12B8alloys have been investigated by means of the d.c. four-probe method. The experimental results indicate that the temperature coefficients of electrical resistivity of the specimens increase after the annealing treatment. We have analysed the characteristics of electronic transport of the amorphous alloys in the structural relaxation process and have observed that annealing treatment increases the temperature coefficient of resistivity of the amorphous alloys.
Keywords :
Amorphous magnetic materials/devices; Relaxation processes; Amorphous materials; Amorphous semiconductors; Annealing; Chemical analysis; Conductivity; Electric resistance; Fluctuations; Physics; Resource description framework; Temperature distribution;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1987.1065286
Filename :
1065286
Link To Document :
بازگشت