DocumentCode
1027428
Title
Avalanche breakdown of diffused silicon p-n junctions
Author
Kokosa, R.A. ; Davies, R.L.
Author_Institution
General Electric Company, Auburn, N. Y.
Issue
12
fYear
1966
Firstpage
874
Lastpage
881
Abstract
Using impact ionization rates of Moll et al. [23] and Lee et al. [24], the avalanche breakdown voltages of diffused silicon p-n junctions were calculated by assuming an error function diffused impurity distribution. The theoretical results were verified experimentally with samples having breakdown voltages ranging from 100 volts to 9000 volts. Good agreement was found between the experimental breakdown voltages and those calculated with the data of Moll et al. This was seen even at high breakdown voltages where the ionizing fields were far lower than those for which ionization rates have been quoted.
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1966.15862
Filename
1474452
Link To Document