• DocumentCode
    1027563
  • Title

    Channel Temperature Determination in High-Power AlGaN/GaN HFETs Using Electrical Methods and Raman Spectroscopy

  • Author

    Simms, Richard J T ; Pomeroy, James W. ; Uren, Michael J. ; Martin, Trevor ; Kuball, Martin

  • Volume
    55
  • Issue
    2
  • fYear
    2008
  • Firstpage
    478
  • Lastpage
    482
  • Abstract
    Self-heating in AlGaN/GaN HFETs was investigated using electrical analysis and micro-Raman thermography. Two typically employed electrical methods were assessed to provide a simple means of extracting average channel temperatures in devices. To quantify the accuracy of these electrical temperature measurements, micro-Raman thermography was used to provide submicron resolution temperature information in the source-drain opening of the devices. We find that electrical methods significantly underestimate peak channel temperatures, due to the fact that electrical techniques measure an average temperature over the entire active device area. These results show that, although electrical techniques can be used to provide qualitative comparisons between different devices, they have challenges for the accurate estimation of peak channel temperatures. This needs to be taken into account for lifetime testing and reliability studies based on electrical temperature measurements.
  • Keywords
    Raman spectroscopy; aluminium compounds; gallium compounds; life testing; power HEMT; semiconductor device measurement; semiconductor device testing; temperature measurement; wide band gap semiconductors; AlGaN-GaN; Raman spectroscopy; channel temperature determination; electrical analysis; electrical temperature measurements; heterostructure field effect transistors; high-power HFET; lifetime testing; micro-Raman thermography; self-heating; source-drain opening; Aluminum gallium nitride; Area measurement; Data mining; Electric variables measurement; Gallium nitride; HEMTs; MODFETs; Raman scattering; Spectroscopy; Temperature measurement; FETs; Raman spectroscopy; gallium compounds; simulation; thermal characterization;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2007.913005
  • Filename
    4420120