DocumentCode
1029668
Title
Thermosonic Wire Bonding Process Simulation and Bond Pad Over Active Stress Analysis
Author
Liu, Yong ; Irving, Scott ; Luk, Timwah
Author_Institution
Fairchild Semicond. Corp., South Portland, ME
Volume
31
Issue
1
fYear
2008
Firstpage
61
Lastpage
71
Abstract
In this paper, a transient nonlinear dynamic finite element framework is developed, which integrates the wire bonding process and the silicon devices under bond pad. Two major areas are addressed: one is the impact of assembly 1st wire bonding process and another one is the impact of device layout below the bond pad. Simulation includes the ultrasonic transient dynamic bonding process and the stress wave transferred to bond pad device and silicon in the 1st bond. The Pierce strain rate dependent model is introduced to model the impact stain hardening effect. Ultrasonic amplitude and frequency are studied and discussed for the bonding process. In addition, different layouts of device metallization under bond pad are analyzed and discussed for the efforts to reduce the dynamic impact response of the bond pad over active design. Modeling discloses the stress and deformation impacts to both wire bonding and pad below device with strain rate, different ultrasonic amplitudes and frequencies, different friction coefficients, as well as different bond pad thickness and device layout under pad. The residual stress, after cooling down to a lower temperature, is discussed for the impact of substrate temperature.
Keywords
finite element analysis; lead bonding; stress analysis; ultrasonic bonding; bond pad; finite element framework; stress analysis; thermosonic wire bonding; ultrasonic transient dynamic bonding; Analytical models; Bonding processes; Capacitive sensors; Finite element methods; Frequency; Residual stresses; Silicon devices; Temperature; Thermal stresses; Wire; Bond pad over active design (BPOA); stress analysis; thermosonic wire bonding; transient dynamics;
fLanguage
English
Journal_Title
Electronics Packaging Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
1521-334X
Type
jour
DOI
10.1109/TEPM.2007.914232
Filename
4427314
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