Title :
Anisotropic etching for forming isolation slots in silicon beam-leaded integrated circuits
Author :
Waggener, H.A. ; Tyler, A.L.
fDate :
6/1/1968 12:00:00 AM
Keywords :
Anisotropic magnetoresistance; Circuits; Electron optics; Electrostatics; Etching; Focusing; Magnetic anisotropy; Perpendicular magnetic anisotropy; Silicon; Testing;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1968.16264
