• DocumentCode
    1031639
  • Title

    Heterostructure complementary technology

  • Author

    Simmons, Jay G. ; Taylor, Graham W.

  • Author_Institution
    University of Bradford, Microelectronics & CADMAT Centre, Bradford, UK
  • Volume
    23
  • Issue
    8
  • fYear
    1987
  • Firstpage
    380
  • Lastpage
    382
  • Abstract
    A complementary inverter configuration based on two new heterostructure field-effect devices is proposed. The FETs are fabricated in a common substrate grown by molecular-beam epitaxy. The devices rely on the formation of inversion layers at heterojunction interfaces.
  • Keywords
    field effect integrated circuits; high electron mobility transistors; invertors; junction gate field effect transistors; GaAs-AlGaAs; complementary inverter configuration; heterojunction interfaces; heterostructure FET; heterostructure JFET; heterostructure field-effect devices; inversion layers; molecular-beam epitaxy;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19870278
  • Filename
    4257607