DocumentCode
1031749
Title
MBE-grown AlGaAs/GaAs HBTs on InP substrate
Author
Ito, H. ; Ishibashi, Takayuki
Author_Institution
NTT Electrical Communications Laboratories, Atsugi, Japan
Volume
23
Issue
8
fYear
1987
Firstpage
394
Lastpage
395
Abstract
AlGaAs/GaAs HBTs are fabricated on InP substrates for the first time. Preliminary results show a current gain of 5 at a collector current density of 2 Ã 104A/cm2 in spite of a dislocation density higher than 109/cm2.
Keywords
III-V semiconductors; aluminium compounds; bipolar transistors; gallium arsenide; molecular beam epitaxial growth; semiconductor growth; AlGaAs-GaAs bipolar transistors; HBTs; InP substrates; MBE growth; collector current density; current gain; dislocation density;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19870288
Filename
4257617
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