Title :
The effect of 〈100〉 orientation of fabrication on high-density, high-speed monolithic circuits
Author :
Grochowski, E.G.
fDate :
6/1/1968 12:00:00 AM
Keywords :
Application specific integrated circuits; Circuit noise; Electron beams; Etching; Fabrication; Image generation; Interference; Lenses; Silicon; Substrates;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1968.16350
