Title :
Fabrication of first-order gratings for 1.5 μm DFB lasers by high-voltage electron-beam lithography
Author :
Fice, Martyn J. ; Ahmed, Hameeza ; Clements, Sid
Author_Institution :
Cambridge University, Microelectronics Research Laboratory, Cambridge, UK
Abstract :
First-order gratings for 1.5 μm-wavelength distributed-feedback lasers have been fabricated reproducibly in InGaAsP by a combination of electron-beam lithography and wet-chemical etching. A high-voltage electron beam (60 kV) of small diameter (50 nm) is employed in the exposure step.
Keywords :
diffraction gratings; distributed feedback lasers; electron beam lithography; laser cavity resonators; semiconductor junction lasers; 1.5 micron; 50 nm; 60 kV; DFB lasers; InGaAsP; first-order gratings; high-voltage electron-beam lithography; wet-chemical etching;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19870424
