Title :
DFB ridge waveguide lasers at λ = 1.5 μm with first-order gratings fabricated using electron beam lithography
Author :
Armistead, C.J. ; Butler, B.R. ; Clements, Stephen J. ; Collar, A.J. ; Moule, D.J. ; Wheeler, S.A. ; Fice, Martyn J. ; Ahmed, Hameeza
Author_Institution :
STC Technology Ltd., Harlow, UK
Abstract :
DFB ridge waveguide lasers at λ = 1.53 μm have been fabricated with uniform first-order gratings defined using electron beam lithography. After MOCVD overgrowth of the grating and fabrication of the ridge waveguides the devices have shown thresholds as low as 22 mA and operation in a single longitudinal mode to powers greater than 10 mW. These results demonstrate that electron beam lithography can be successfully used for the fabrication of DFB lasers with the fine pitch required for first-order gratings.
Keywords :
diffraction gratings; distributed feedback lasers; electron beam lithography; laser cavity resonators; semiconductor junction lasers; 1.5 micron; 1.53 micron; 10 mW; 22 mA; DFB ridge waveguide lasers; MOCVD overgrowth; electron beam lithography; first-order gratings; operation; single longitudinal mode; thresholds; uniform first-order gratings;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19870425
