DocumentCode
1033810
Title
Elimination of the guard ring in uniform avalanche photodiodes
Author
Lynch, W.T.
Author_Institution
Bell Telephone Laboratories, Inc., Murray Hill, N.J.
Volume
15
Issue
10
fYear
1968
fDate
10/1/1968 12:00:00 AM
Firstpage
735
Lastpage
741
Abstract
A conventional
(or
) planar avalanche photodiode with a 10-4cm2active area has ∼2.5 × 10-4cm2total area because of its protecting guard ring and has a series resistance of ∼50 to 100 ohms. For narrow-band applications, multiplications greater than 10 are necessary to equal the available output power of a conventional nonavalanching
photodiode. In broad-band applications, significant multiplications are necessary to compete favorably with the
when the active area is less than 10-4cm2or when the signal frequency is > 1 GHz. A
planar structure is discussed that eliminates the need for a guard ring because positive junction curvature occurs on the high-resistivity side. The
diodes can be designed to have resistances (Rs ∼2 ohms), capacitances (C < 1 pf), and RC cutoff frequencies (fco >100 GHz) equivalent to those of the
and to have uniform multiplication as well. Closer array spacings can be achieved than with the guard ring structure, as well as higher effective quantum efficiencies in the avalanche mode. Practical realization of the
structure has been achieved in silicon by a combination of epitaxial and doped-oxide processing. Seven-mil-diameter junctions with high breakdown voltage (110 V) and uniform avalanche properties have been constructed.
(or
) planar avalanche photodiode with a 10-4cm2active area has ∼2.5 × 10-4cm2total area because of its protecting guard ring and has a series resistance of ∼50 to 100 ohms. For narrow-band applications, multiplications greater than 10 are necessary to equal the available output power of a conventional nonavalanching
photodiode. In broad-band applications, significant multiplications are necessary to compete favorably with the
when the active area is less than 10-4cm2or when the signal frequency is > 1 GHz. A
planar structure is discussed that eliminates the need for a guard ring because positive junction curvature occurs on the high-resistivity side. The
diodes can be designed to have resistances (R
and to have uniform multiplication as well. Closer array spacings can be achieved than with the guard ring structure, as well as higher effective quantum efficiencies in the avalanche mode. Practical realization of the
structure has been achieved in silicon by a combination of epitaxial and doped-oxide processing. Seven-mil-diameter junctions with high breakdown voltage (110 V) and uniform avalanche properties have been constructed.Keywords
Avalanche photodiodes; Capacitance; Cutoff frequency; Narrowband; P-i-n diodes; P-n junctions; PIN photodiodes; Power generation; Protection; Silicon;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1968.16507
Filename
1475409
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