DocumentCode :
1033810
Title :
Elimination of the guard ring in uniform avalanche photodiodes
Author :
Lynch, W.T.
Author_Institution :
Bell Telephone Laboratories, Inc., Murray Hill, N.J.
Volume :
15
Issue :
10
fYear :
1968
fDate :
10/1/1968 12:00:00 AM
Firstpage :
735
Lastpage :
741
Abstract :
A conventional p^{+}-n (or n^{+}-p ) planar avalanche photodiode with a 10-4cm2active area has ∼2.5 × 10-4cm2total area because of its protecting guard ring and has a series resistance of ∼50 to 100 ohms. For narrow-band applications, multiplications greater than 10 are necessary to equal the available output power of a conventional nonavalanching p-i-n photodiode. In broad-band applications, significant multiplications are necessary to compete favorably with the p-i-n when the active area is less than 10-4cm2or when the signal frequency is > 1 GHz. A p-n^{+} planar structure is discussed that eliminates the need for a guard ring because positive junction curvature occurs on the high-resistivity side. The p-n^{+} diodes can be designed to have resistances (Rs∼2 ohms), capacitances (C < 1 pf), and RC cutoff frequencies (fco>100 GHz) equivalent to those of the p-i-n and to have uniform multiplication as well. Closer array spacings can be achieved than with the guard ring structure, as well as higher effective quantum efficiencies in the avalanche mode. Practical realization of the p-n^{+} structure has been achieved in silicon by a combination of epitaxial and doped-oxide processing. Seven-mil-diameter junctions with high breakdown voltage (110 V) and uniform avalanche properties have been constructed.
Keywords :
Avalanche photodiodes; Capacitance; Cutoff frequency; Narrowband; P-i-n diodes; P-n junctions; PIN photodiodes; Power generation; Protection; Silicon;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1968.16507
Filename :
1475409
Link To Document :
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