DocumentCode :
1033988
Title :
Fully implanted GaAs millimetre-wave mixer diode using high energy implantation
Author :
Thompson, Paul ; Dietrich, H. ; Anand, Y. ; Higgins, V. ; Hillson, J.
Author_Institution :
Naval Research Laboratory, Washington, USA
Volume :
23
Issue :
14
fYear :
1987
Firstpage :
725
Lastpage :
727
Abstract :
Fully implanted GaAs millimetre-wave planar mixer diodes, suitable for monolithic integration, have been fabricated and tested. Multiple energy implantation, having a maximum energy of 6 MeV, was used to form the 3 ¿m-thick active layer. The DC and RF characteristics were comparable to state-of-the-art GaAs mixer diodes fabricated on epitaxial layers.
Keywords :
III-V semiconductors; gallium arsenide; ion implantation; mixers (circuits); semiconductor diodes; solid-state microwave devices; 6 MeV; DC characteristics; GaAs; RF characteristics; active layer; high energy implantation; millimetre-wave mixer diode; monolithic integration;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19870515
Filename :
4257850
Link To Document :
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