Title :
New alternative graphing methods for thin-film interferometry data
Author :
Maynard, Helen L. ; Hershkowitz, Noah
Author_Institution :
Eng. Res. Center for Plasma Aided Manuf., Wisconsin Univ., Madison, WI, USA
fDate :
11/1/1993 12:00:00 AM
Abstract :
Thin-film interferometry has long been used to monitor deposition and etching processes. The authors present Lissajous and phase-space graphs of thin-film interferometry traces and discuss some of the practical implications of graphing the data in these nontraditional formats. These types of graphs can highlight certain process events and provide a more user-friendly operator interface for the control of thin-film etching and deposition processes
Keywords :
etching; light interferometry; semiconductor growth; semiconductor technology; Lissajous; deposition processes; graphing methods; phase-space graphs; process events; thin-film etching; thin-film interferometry data; user-friendly operator interface; Etching; Monitoring; Optical films; Optical interferometry; Optical reflection; Optical refraction; Plasma applications; Substrates; Surface emitting lasers; Transistors;
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
