• DocumentCode
    1034171
  • Title

    IGFET Analysis through numerical solution of Poisson´s equation

  • Author

    Schroeder, James E. ; Muller, Richard S.

  • Author_Institution
    University of California, Berkeley, Calif.
  • Volume
    15
  • Issue
    12
  • fYear
    1968
  • fDate
    12/1/1968 12:00:00 AM
  • Firstpage
    954
  • Lastpage
    961
  • Abstract
    Numerical techniques have been used to obtain the field distribution in IGFETs under saturated bias conditions. The numerical solution of Poisson´s equation is obtained with fewer simplifying assumptions than are necessary to obtain an analytic solution. The numerical solution is used to calculate the change in channel length as bias values are varied. These changes are used to predict the voltage dependences of drain current, drain conductance and transconductance in saturation. The potential solutions also permit a rough calculation of breakdown voltages. A comparison is made between the theoretical results and measurements on IGFETs of varying dimensions and doping concentrations.
  • Keywords
    Aluminum; Chemicals; Insulation; Phosphors; Poisson equations; Semiconductor films; Silicon; Springs; Thermal decomposition; Transconductance;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1968.16545
  • Filename
    1475447