DocumentCode
1035222
Title
Very low threshold current density of a GaInP/AlGaInP double-heterostructure laser grown by MOCVD
Author
Nakano, K. ; Ikeda, M. ; Toda, A. ; Kojima, C.
Author_Institution
Sony Corporation, Research Center, Yokohama, Japan
Volume
23
Issue
17
fYear
1987
Firstpage
894
Lastpage
895
Abstract
A GaInP/AlGaInP broad-area (60 à 500 ¿m2) laser grown by MOCVD has obtained a very low threshold current density Jth of 1.1 kA/cm2. The dependence of Jth and differential quantum efficiency on cavity length was measured to determine internal quantum efficiency, losses and the gain constant, which were found to be comparable to these characteristics in an AlGaAs laser.
Keywords
III-V semiconductors; aluminium compounds; chemical vapour deposition; gallium compounds; indium compounds; semiconductor junction lasers; 500 micron; DH lasers; GaInP-AlGaInP lasers; MOCVD; cavity length; differential quantum efficiency; double-heterostructure laser; gain constant; internal quantum efficiency; losses; low threshold current density; visible light lasers;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19870632
Filename
4257970
Link To Document