DocumentCode
1035957
Title
Study of the inversion layer mobility and the improvement in gm of MOSFET
Author
Nishi, Yoshio ; Tanaka, Kiyoshi
Volume
16
Issue
2
fYear
1969
fDate
2/1/1969 12:00:00 AM
Firstpage
258
Lastpage
258
Keywords
Absorption; FETs; Laboratories; MOSFET circuits; Paramagnetic materials; Paramagnetic resonance; Quantization; Semiconductor device noise; Thermal resistance; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1969.16731
Filename
1475773
Link To Document