• DocumentCode
    1038647
  • Title

    Carrier trapping and recombination in avalanche diodes

  • Author

    Eernisse, E.P. ; Chaffin, Roger J.

  • Author_Institution
    Sandia Laboratories, Albuquerque, N. Mex.
  • Volume
    17
  • Issue
    7
  • fYear
    1970
  • fDate
    7/1/1970 12:00:00 AM
  • Firstpage
    520
  • Lastpage
    526
  • Abstract
    The differential equations describing an avalanching p+nn+junction in the presence of multiple-level carrier traps have been solved numerically for trap densities as high as two orders of magnitude greater than the n-region background doping. The results compare quantitatively with a number of past, as well as new, experimentally observed changes in avalanche microwave diode performance with neutron damage. In particular, trapped charge in the space-charge region tends to localize the avalanche region near the p+n junction, which raises the frequencies of operation. Carrier trapping at the edges of the space-charge region explains the increase in operating voltage and decrease in small-signal capacitance. The localization of the avalanche region, through carrier trapping in the space-charge region, and recombination effects at high avalanche current densities combine to cause eventual RF failure of IMPATT and TRAPATT diodes with neutron damage.
  • Keywords
    Charge carrier processes; Couplings; Diodes; Doping; Electron traps; Lattices; Microwave devices; Neutrons; Physics; Poisson equations;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1970.17024
  • Filename
    1476208