DocumentCode :
1038699
Title :
Negative differential resistance produced by Joule heating in semiconductors
Author :
Kao, K.C.
Volume :
17
Issue :
7
fYear :
1970
fDate :
7/1/1970 12:00:00 AM
Firstpage :
562
Lastpage :
564
Abstract :
A simple analysis indicates that negative differential resistance (NDR) characteristics may be made possible by an intervalley electron-transfer process enhanced by Joule heating in semiconductors at low fields. The negative temperature coefficient of electronic mobility of semiconductors is also favorable to the achievement of NDR.
Keywords :
Capacitance; Conductors; Current measurement; Doping; Electrons; Frequency measurement; MOS capacitors; Resistance heating; Temperature; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1970.17030
Filename :
1476214
Link To Document :
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