DocumentCode
1039240
Title
Recent developments of magnetic film memories in Japan
Author
Oshima, Shtxtaro
Author_Institution
Kokusai Denshin Denwa Company, Ltd., Tokyo, Japan
Volume
5
Issue
3
fYear
1969
fDate
9/1/1969 12:00:00 AM
Firstpage
392
Lastpage
398
Abstract
Magnetic thin-film memories that are now in practical use or under development in Japan are surveyed, and related technical problems are discussed. The main problems include the use of multilayered film for NDRO operation and the improvement on its switching characteristics, the confirmation of reliability of thin films, and the selection of flux keeper for very high density memory. States of art in connection with plated-wire memories, planar-film memories, and semipermanent memories are reviewed, and a new type of closed-flux-path memory of high packing density is also introduced.
Keywords
Japan; Magnetic film memories; Multilayer magnetic films; Copper; Fabrication; Magnetic anisotropy; Magnetic fields; Magnetic films; Magnetic properties; Magnetic switching; Perpendicular magnetic anisotropy; Transistors; Wire;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1969.1066423
Filename
1066423
Link To Document