• DocumentCode
    1039667
  • Title

    A novel transparent electrode process

  • Author

    Grosso, Patrick F. ; Heck, Raymond F.

  • Author_Institution
    CBS Laboratories, Stamford, Conn.
  • Volume
    17
  • Issue
    12
  • fYear
    1970
  • fDate
    12/1/1970 12:00:00 AM
  • Firstpage
    1083
  • Lastpage
    1085
  • Abstract
    A novel process for the formation of thin-film, optical-quality conductive electrodes for use in electrophoretic deposition of high-resolution phosphor screens is described. The thin-film metal electrodes can be removed from under the phosphor either chemically or by vacuum sublimation leaving a completely transparent interface. The metal electrodes show good adherence to substrates and are low in pinhole density. High condensation rates are obtained through the use of nucleation techniques.
  • Keywords
    Atomic layer deposition; Coatings; Conductive films; Electrodes; Electron devices; Large scale integration; Optical distortion; Phosphors; Silicon; Substrates;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1970.17129
  • Filename
    1476313