DocumentCode
1039667
Title
A novel transparent electrode process
Author
Grosso, Patrick F. ; Heck, Raymond F.
Author_Institution
CBS Laboratories, Stamford, Conn.
Volume
17
Issue
12
fYear
1970
fDate
12/1/1970 12:00:00 AM
Firstpage
1083
Lastpage
1085
Abstract
A novel process for the formation of thin-film, optical-quality conductive electrodes for use in electrophoretic deposition of high-resolution phosphor screens is described. The thin-film metal electrodes can be removed from under the phosphor either chemically or by vacuum sublimation leaving a completely transparent interface. The metal electrodes show good adherence to substrates and are low in pinhole density. High condensation rates are obtained through the use of nucleation techniques.
Keywords
Atomic layer deposition; Coatings; Conductive films; Electrodes; Electron devices; Large scale integration; Optical distortion; Phosphors; Silicon; Substrates;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1970.17129
Filename
1476313
Link To Document