DocumentCode :
1039667
Title :
A novel transparent electrode process
Author :
Grosso, Patrick F. ; Heck, Raymond F.
Author_Institution :
CBS Laboratories, Stamford, Conn.
Volume :
17
Issue :
12
fYear :
1970
fDate :
12/1/1970 12:00:00 AM
Firstpage :
1083
Lastpage :
1085
Abstract :
A novel process for the formation of thin-film, optical-quality conductive electrodes for use in electrophoretic deposition of high-resolution phosphor screens is described. The thin-film metal electrodes can be removed from under the phosphor either chemically or by vacuum sublimation leaving a completely transparent interface. The metal electrodes show good adherence to substrates and are low in pinhole density. High condensation rates are obtained through the use of nucleation techniques.
Keywords :
Atomic layer deposition; Coatings; Conductive films; Electrodes; Electron devices; Large scale integration; Optical distortion; Phosphors; Silicon; Substrates;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1970.17129
Filename :
1476313
Link To Document :
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