• DocumentCode
    1039772
  • Title

    160°C CW operation of InGaAs/GaAs vertical cavity surface emitting lasers

  • Author

    Shoji, Hajime ; Otsubo, K. ; Matsuda, Manabu ; Ishikawa, Hiroshi

  • Author_Institution
    Optoelectron. Res. Div., Fujitsu Labs. Ltd., Atsugi
  • Volume
    30
  • Issue
    5
  • fYear
    1994
  • fDate
    3/3/1994 12:00:00 AM
  • Firstpage
    409
  • Lastpage
    410
  • Abstract
    A CW operation temperature of 160°C is demonstrated in InGaAs/GaAs double quantum well vertical cavity surface emitting lasers (VCSELs). The effect of offset-gain is considered in the design, and wet chemical etching is employed for forming the mesa structure to reduce surface recombination. A low threshold current of 5.2 mA is achieved at 160°C
  • Keywords
    III-V semiconductors; gallium arsenide; indium compounds; laser cavity resonators; semiconductor lasers; 160 C; 5.2 mA; CW operation; CW operation temperature; InGaAs-GaAs; InGaAs/GaAs vertical cavity surface emitting lasers; design; double quantum well vertical cavity surface emitting lasers; low threshold current; mesa structure; offset-gain; surface recombination; wet chemical etching;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19940265
  • Filename
    273265