• DocumentCode
    1039790
  • Title

    Semiconductor impurity analysis from low-frequency noise spectra

  • Author

    Copeland, John A.

  • Author_Institution
    Bell Telephone Laboratories, Inc., Murray Hill, N. J.
  • Volume
    18
  • Issue
    1
  • fYear
    1971
  • fDate
    1/1/1971 12:00:00 AM
  • Firstpage
    50
  • Lastpage
    53
  • Abstract
    The usefulness of material for semiconductor devices can be degraded by the presence of deep impurity levels or traps which are often difficult to detect. The equations necessary for using the noise emitted by a uniform semiconductor when biased with a small dc current to find the energy, degeneracy factor, density, and time constants of such a deep level are derived. The theory was verified by an experimental study of a level in n-GaAs which was found to have an energy 0.175 eV below the conduction band and an acceptor-like degeneracy factor of 4. This technique appears to be useful for fundamental studies and as a means of monitoring material used for devices.
  • Keywords
    Conducting materials; Degradation; Equations; Low-frequency noise; Monitoring; Noise level; Semiconductor device noise; Semiconductor devices; Semiconductor impurities; Semiconductor materials;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1971.17142
  • Filename
    1476464