Title :
Comments on hot carrier noise in field-effect transistors
Author_Institution :
Philips Research Laboratories, Eindhoven, Holland
Abstract :
Taking into account more rigorously such high field effects as velocity saturation and an increasing free carrier temperature, a new derivation is presented for the output noise of the field-effect transistor. It is shown that for devices with a short channel and a high saturation voltage the equivalent noise resistance can increase considerably above the low field value.
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1971.17150