DocumentCode
1040354
Title
Base diffusion isolated transistors for low power integrated circuits
Author
Senhouse, L.S., Jr. ; Kushler, D.L. ; Murphy, B.T.
Author_Institution
Bell Telephone Laboratories, Inc., Murray Hill, N. J.
Volume
18
Issue
6
fYear
1971
fDate
6/1/1971 12:00:00 AM
Firstpage
355
Lastpage
358
Abstract
Base diffusion isolated transistors (BDI) designed for low power, nonsaturating, integrated circuits have been fabricated. Buried collectors are unnecessary in these low power devices, resulting in structures equivalent to discrete transistors in complexity of fabrication. A low-current power supply is required for isolation purposes. Transistor characteristics differ negligibly from those of standard transistors at collector currents <0.05 mA, and are satisfactory for application in linear circuits at currents up to at least 0.1 mA. Transistor fT is 80 MHz at 0.1 mA emitter current, 2 V collector voltage.
Keywords
Bipolar transistor circuits; Capacitance; Contact resistance; Epitaxial layers; Fabrication; Linear circuits; Power integrated circuits; Power supplies; Production facilities; Substrates;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1971.17201
Filename
1476523
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