• DocumentCode
    1040354
  • Title

    Base diffusion isolated transistors for low power integrated circuits

  • Author

    Senhouse, L.S., Jr. ; Kushler, D.L. ; Murphy, B.T.

  • Author_Institution
    Bell Telephone Laboratories, Inc., Murray Hill, N. J.
  • Volume
    18
  • Issue
    6
  • fYear
    1971
  • fDate
    6/1/1971 12:00:00 AM
  • Firstpage
    355
  • Lastpage
    358
  • Abstract
    Base diffusion isolated transistors (BDI) designed for low power, nonsaturating, integrated circuits have been fabricated. Buried collectors are unnecessary in these low power devices, resulting in structures equivalent to discrete transistors in complexity of fabrication. A low-current power supply is required for isolation purposes. Transistor characteristics differ negligibly from those of standard transistors at collector currents <0.05 mA, and are satisfactory for application in linear circuits at currents up to at least 0.1 mA. Transistor fTis 80 MHz at 0.1 mA emitter current, 2 V collector voltage.
  • Keywords
    Bipolar transistor circuits; Capacitance; Contact resistance; Epitaxial layers; Fabrication; Linear circuits; Power integrated circuits; Power supplies; Production facilities; Substrates;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1971.17201
  • Filename
    1476523