Title :
Dielectric effects of ferrite flux keepers in thin-film memories
Author :
Feltl, H. ; Harloff, H.J. ; Kiszel, Z. ; Seefeldner, W.
Author_Institution :
Siemens AG, Zentral-Laboratorium, Munich, Germany.
fDate :
9/1/1969 12:00:00 AM
Keywords :
Dielectric constant; Dielectric substrates; Dielectric thin films; Ferrites; High-K gate dielectrics; Magnetic flux; Magnetic separation; Permeability; Space vector pulse width modulation; Wires;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.1969.1066579
