• DocumentCode
    1041434
  • Title

    Charge generation and collection in p-n junctions excited with pulsed infrared lasers

  • Author

    Johnston, A.H.

  • Author_Institution
    Jet Propulsion Lab., California Inst. of Technol., Pasadena, CA, USA
  • Volume
    40
  • Issue
    6
  • fYear
    1993
  • fDate
    12/1/1993 12:00:00 AM
  • Firstpage
    1694
  • Lastpage
    1702
  • Abstract
    The author examines optical absorption processes for applications of infrared lasers to the simulation of single-particle effects in silicon and GaAs, which require that the laser is focused to a small area on the device surface. The resulting charge generation is compared with charge generation from heavy ions. Charge funneling is reduced in silicon structures because of the lower charge density unless the LET (linear energy transfer) is above a threshold value. In both materials, the effective LET of a laser is inherently nonlinear because of nonlinear absorption at high intensities. These factors limit quantitative comparisons between lasers and heavy ions, and are increasingly important as devices are scaled to smaller dimensions
  • Keywords
    III-V semiconductors; carrier density; elemental semiconductors; energy gap; gallium arsenide; laser beam effects; light absorption; p-n homojunctions; silicon; CMOS structure; GaAs; LET; Si; bandgap narrowing; carrier density; charge density; charge funneling; charge generation; device scaling; linear energy transfer; nonlinear absorption; optical absorption processes; p-n junctions; pulsed infrared lasers; simulation; single-particle effects; Electromagnetic wave absorption; Gallium arsenide; Laser applications; Laser excitation; Nonlinear optics; Optical devices; P-n junctions; Particle beam optics; Silicon; Surface emitting lasers;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/23.273491
  • Filename
    273491