DocumentCode
1041434
Title
Charge generation and collection in p-n junctions excited with pulsed infrared lasers
Author
Johnston, A.H.
Author_Institution
Jet Propulsion Lab., California Inst. of Technol., Pasadena, CA, USA
Volume
40
Issue
6
fYear
1993
fDate
12/1/1993 12:00:00 AM
Firstpage
1694
Lastpage
1702
Abstract
The author examines optical absorption processes for applications of infrared lasers to the simulation of single-particle effects in silicon and GaAs, which require that the laser is focused to a small area on the device surface. The resulting charge generation is compared with charge generation from heavy ions. Charge funneling is reduced in silicon structures because of the lower charge density unless the LET (linear energy transfer) is above a threshold value. In both materials, the effective LET of a laser is inherently nonlinear because of nonlinear absorption at high intensities. These factors limit quantitative comparisons between lasers and heavy ions, and are increasingly important as devices are scaled to smaller dimensions
Keywords
III-V semiconductors; carrier density; elemental semiconductors; energy gap; gallium arsenide; laser beam effects; light absorption; p-n homojunctions; silicon; CMOS structure; GaAs; LET; Si; bandgap narrowing; carrier density; charge density; charge funneling; charge generation; device scaling; linear energy transfer; nonlinear absorption; optical absorption processes; p-n junctions; pulsed infrared lasers; simulation; single-particle effects; Electromagnetic wave absorption; Gallium arsenide; Laser applications; Laser excitation; Nonlinear optics; Optical devices; P-n junctions; Particle beam optics; Silicon; Surface emitting lasers;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/23.273491
Filename
273491
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