Domain configurations in laminated thin magnetic films

Domain configurations in laminated magnetic film elements comprising two equal thickness layers of Permalloy separated by silicon monoxide are described. Individual layer thicknesses were in the range 15 to 200 nm. Elements with NiFe layers less than 100 nm thick show line domains and a locked domain structure on easy-axis field switching. These effects are attributed to magnetostatic effects between the laminations, as is the extended range of film thicknesses exhibiting Néel-type walls. In the range 90- to 200-nm NiFe thickness, anomalous domain propagation takes place, possibly the result of ordered growth of the upper magnetic layer.