DocumentCode :
1041760
Title :
hFEfalloff at low temperatures
Author :
Gopen, Howard J. ; Yu, Albert Y C
Author_Institution :
Intel Corporation, Mountain View, Calif.
Volume :
18
Issue :
12
fYear :
1971
fDate :
12/1/1971 12:00:00 AM
Firstpage :
1146
Lastpage :
1148
Abstract :
It is shown that for shallow planar bipolar transistors, tunneling, currents through the emitter-base junction can cause pronounced hFEfalloff at low temperatures.
Keywords :
Bipolar transistors; Cameras; Helium; Instruments; Iron; Laboratories; Microwave transistors; Research and development; Temperature dependence; Tunneling;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1971.17345
Filename :
1476667
Link To Document :
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