DocumentCode :
1041933
Title :
Separation of effects of oxide-trapped charge and interface-trapped charge on mobility in irradiated power MOSFETs
Author :
Zupac, D. ; Galloway, K.F. ; Khosropour, P. ; Anderson, S.R. ; Schrimpf, R.D. ; Calvel, P.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Arizona, Tucson, AZ, USA
Volume :
40
Issue :
6
fYear :
1993
fDate :
12/1/1993 12:00:00 AM
Firstpage :
1307
Lastpage :
1315
Abstract :
An effective approach to separating the effects of oxide-trapped charge and interface-trapped charge on mobility degradation in irradiated MOSFETs is demonstrated. It is based on analyzing mobility data sets that have different functional relationships between the radiation-induced-oxide-trapped charge and interface-trapped charge. Separation of the effects of these two trapped charge components is only possible if they are not linearly dependent. A significant contribution of oxide-trapped charge to mobility degradation is demonstrated and quantified
Keywords :
annealing; carrier mobility; electron traps; gamma-ray effects; insulated gate field effect transistors; interface electron states; power transistors; semiconductor device models; semiconductor device testing; annealing; gamma irradiation; interface-trapped charge; irradiated power MOSFETs; mobility degradation; oxide-trapped charge; radiation-induced trapped charge; Annealing; Contracts; Data analysis; Degradation; Ionizing radiation; MOSFETs; Scattering; Stress; Sun; Temperature;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.273537
Filename :
273537
Link To Document :
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