• DocumentCode
    1042021
  • Title

    Anisotropy modifications and domain-wall behavior in grooved films

  • Author

    Berkowitz, Ami E. ; Schuele, William J. ; Morey, Ken R.

  • Author_Institution
    General Electric Research and Development Center, Schenectady, N. Y.
  • Volume
    6
  • Issue
    1
  • fYear
    1970
  • fDate
    3/1/1970 12:00:00 AM
  • Firstpage
    130
  • Lastpage
    134
  • Abstract
    Patterns of 5-μm-wide grooves on 25-μm centers were partially etched in the easy and/or hard directions in uniaxial Permalloy films; 20-μm-diameter circles or 25-μm centers were also etched. The easy direction grooves modified the anisotropy of the films to produce an NDRO behavior, while the hard direction grooves resulted in biaxial symmetry. Coercive force of the easy direction grooved films increased as a result of the lower energy of 180° walls in the thinner grooved regions. Pairs of crossties and the Bloch lines between them were confined to grooves in the hard direction. Creep sensitivity was markedly decreased in hard direction grooved films. This creep control probably results from the limitation of Bloch-line motion by the hard direction grooves, in agreement with several recent suggestions concerning the mechanism of creep in crosstie walls.
  • Keywords
    Permalloy films; Ambient intelligence; Anisotropic magnetoresistance; Chemicals; Coercive force; Creep; Geometry; Resists; Sparks; Sputter etching; Substrates;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1970.1066686
  • Filename
    1066686