Title :
Alternate multiwavelength modelocked fiber laser
Author :
Vasseur, Jérôme ; Hanna, Marc ; Dudley, John ; Goedgebuer, Jean-Pierre
Author_Institution :
GTL-CNRS Telecom, Metz, France
Abstract :
We demonstrate alternate mode-locking of three 30-ps pulse trains at three different wavelengths, each at a repetition rate of 3.8 GHz. The successive multiwavelength pulsed operation is reached in an actively mode-locked erbium-doped fiber laser in which an unbalanced Mach-Zehnder interferometer has been introduced. This component plays both the role of intensity modulator and tunable filter.
Keywords :
diffraction gratings; diffractive optical elements; fibre lasers; focused ion beam technology; integrated optics; laser mode locking; optical fabrication; sputter etching; 30 ps; 660 nm; etching; focused ion beam etching; grating orientation; grating pitches; linear grating configuration; monolithic integration; polarization; red vertical-cavity lasers; threshold current; two-dimensional grating configuration; vertical-cavity surface-emitting lasers; wavelength-scale diffractive optical elements; wavelength-scale diffractive structures; zeroth-order diffracted beam; Erbium-doped fiber lasers; Fiber lasers; Filters; Frequency; Laser mode locking; Laser modes; Laser tuning; Optical interferometry; Optical pulse generation; Transfer functions;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2004.829774
