DocumentCode :
1042349
Title :
Externally Assembled Gate-All-Around Carbon Nanotube Field-Effect Transistor
Author :
Chen, Zhihong ; Farmer, Damon ; Xu, Sheng ; Gordon, Roy ; Avouris, Phaedon ; Appenzeller, Joerg
Author_Institution :
IBM T J. Watson Res. Center, Yorktown Heights, NY
Volume :
29
Issue :
2
fYear :
2008
Firstpage :
183
Lastpage :
185
Abstract :
In this letter, we demonstrate a gate-all-around single-wall carbon nanotube field-effect transistor. This is the first successful experimental implementation of an off-chip gate and gate-dielectric assembly with subsequent deposition on a suitable substrate. The fabrication process and device measurements are discussed in the letter. We also argue in how far charges in the gate oxide are responsible for the observed nonideal device performance.
Keywords :
annealing; atomic layer deposition; carbon nanotubes; field effect transistors; semiconductor nanotubes; C; annealing; atomic layer deposition; gate-all-around structure; gate-dielectric assembly; off-chip gate assembly; single-wall carbon nanotube field-effect transistor; Aluminum oxide; Assembly; CNTFETs; Carbon nanotubes; Chemicals; Dielectric substrates; Electrostatics; FETs; Fabrication; Nanobioscience; Carbon nanotube (CN); field-effect transistor (FET); gate-all-around (GAA);
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2007.914069
Filename :
4435964
Link To Document :
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