• DocumentCode
    1042408
  • Title

    On the Roll-Off of the Activation Energy Plot in High-Temperature Flash Memory Retention Tests and its Impact on the Reliability Assessment

  • Author

    Govoreanu, Bogdan ; Van Houdt, Jan

  • Author_Institution
    Interuniversity Microelectron. Centre (IMEC) Leuven, Leuven
  • Volume
    29
  • Issue
    2
  • fYear
    2008
  • Firstpage
    177
  • Lastpage
    179
  • Abstract
    In this letter, we discuss the experimental behavior of high-kappa interpoly dielectrics in floating gate memory devices with respect to the activation energy plot. It is shown that the Arrhenius extrapolation may overestimate the ten-year lifetime predictions. However, a clear correlation between the activation energy plot and the trap levels in the interpoly dielectric can be established, based on theoretical grounds. It is shown that a single-trap level typically follows an 1/T law, while a roll-off of the activation energy plot suggests the existence of various trap levels in the interpoly dielectrics. These findings have practical implications on the high-temperature retention testing methodology of novel nonvolatile memory with high-kappa interpoly dielectrics.
  • Keywords
    flash memories; integrated memory circuits; random-access storage; reliability; Arrhenius extrapolation; activation energy plot; floating gate memory devices; high-kappa interpoly dielectrics; high-temperature flash memory retention tests; nonvolatile memory; reliability assessment; single-trap level; Capacitors; Dielectric losses; Etching; Flash memory; Hafnium; Microelectronics; Nonvolatile memory; Temperature; Testing; Voltage; Activation energy; Flash memory; high- $kappa$; interpoly dielectrics; retention time;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2007.914089
  • Filename
    4435971