DocumentCode
1042408
Title
On the Roll-Off of the Activation Energy Plot in High-Temperature Flash Memory Retention Tests and its Impact on the Reliability Assessment
Author
Govoreanu, Bogdan ; Van Houdt, Jan
Author_Institution
Interuniversity Microelectron. Centre (IMEC) Leuven, Leuven
Volume
29
Issue
2
fYear
2008
Firstpage
177
Lastpage
179
Abstract
In this letter, we discuss the experimental behavior of high-kappa interpoly dielectrics in floating gate memory devices with respect to the activation energy plot. It is shown that the Arrhenius extrapolation may overestimate the ten-year lifetime predictions. However, a clear correlation between the activation energy plot and the trap levels in the interpoly dielectric can be established, based on theoretical grounds. It is shown that a single-trap level typically follows an 1/T law, while a roll-off of the activation energy plot suggests the existence of various trap levels in the interpoly dielectrics. These findings have practical implications on the high-temperature retention testing methodology of novel nonvolatile memory with high-kappa interpoly dielectrics.
Keywords
flash memories; integrated memory circuits; random-access storage; reliability; Arrhenius extrapolation; activation energy plot; floating gate memory devices; high-kappa interpoly dielectrics; high-temperature flash memory retention tests; nonvolatile memory; reliability assessment; single-trap level; Capacitors; Dielectric losses; Etching; Flash memory; Hafnium; Microelectronics; Nonvolatile memory; Temperature; Testing; Voltage; Activation energy; Flash memory; high- $kappa$ ; interpoly dielectrics; retention time;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2007.914089
Filename
4435971
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