DocumentCode :
1042633
Title :
Electrophotographic processes using a dielectric layer bonded to a photoconductive layer as in the Katsuragawa process
Author :
Nakamura, Kenichi
Author_Institution :
Waseda University, Tokyo, Japan
Volume :
19
Issue :
4
fYear :
1972
fDate :
4/1/1972 12:00:00 AM
Firstpage :
405
Lastpage :
412
Abstract :
With a photosensitive plate having a dielectric overcoating, an electrophotographic process available for repeated operation is developed. This process consists of three steps, utilizing the effect of photopolarization. An important feature is to allow the employment of higher photoconductive layers. As a result, high photosensitivity and high electrostatic contrast in electrophotography are achieved with this process. Factors determining the sensitivity are the rate of dark depolarization and light polarization and, in addition, the corona charging rate. This process may make possible applications in fields where only a slight exposure is allowed. What occurs in each step of this process is investigated analytically and experimentally.
Keywords :
Bonding; Corona; Dielectric substrates; Electrodes; Electrostatics; Optical polarization; Photoconducting materials; Photoconductivity; Surface charging; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1972.17436
Filename :
1476907
Link To Document :
بازگشت