Title :
Dual Gate ZnO-Based Thin-Film Transistors Operating at 5 V: nor Gate Application
Author :
Park, C.H. ; Lee, Kwang H. ; Oh, Min Suk ; Lee, Kimoon ; Im, Seongil ; Lee, Byoung H. ; Sung, Myung M.
Author_Institution :
Inst. of Phys. & Appl. Phys., Yonsei Univ., Seoul
Abstract :
We report on the fabrication of ZnO-based dual gate (DG) thin-film transistors (TFTs) with 20-nm-thick Al2O3 for both top and bottom dielectrics, which were deposited by atomic layer deposition on glass substrates at 200 degC. As characterized with single gate (SG), DG, and ground plane (GP) modes, our ZnO TFTs are well operated under 5 V. DG-mode TFT showed a field mobility of 0.38 cm2/V middots, a high saturation current of 6 muA, and an on/off current ratio of ~ 106, while SG- and GP-mode TFTs showed a similar value of mobility but with lower current. Using DG and GP modes, nor gate operation was well demonstrated.
Keywords :
II-VI semiconductors; logic gates; thin film transistors; wide band gap semiconductors; zinc compounds; NOR gate operation; ZnO; atomic layer deposition; dielectrics; dual gate transistors; field mobility; glass substrates; on/off current ratio; saturation current; size 20 nm; temperature 200 degC; thin-film transistors; voltage 5 V; Dual gate (DG); NOR logic gate; ZnO; thin-film transistors (TFTs);
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2008.2007973
