DocumentCode
1043315
Title
Properties of MNOS structures
Author
Lundström, K. Ingemar ; Svensson, Christer M.
Author_Institution
Chalmers University of Technology, Gothenburg, Sweden
Volume
19
Issue
6
fYear
1972
fDate
6/1/1972 12:00:00 AM
Firstpage
826
Lastpage
836
Abstract
The properties of thin oxide MNOS structures are studied. An analytical theory for the switching time constant is derived and curves of the switching time constant versus the nitride field are computed. These curves are useful in the design of MNOS-memory transistors. The theory is compared with experiments. The normal current in the thin oxide MNOS structures is assumed to be a modified Fowler-Nordheim current. At small oxide thicknesses and low nitride field, an additional current is shown to exist that is attributed to direct tunneling into traps in the nitride. The discharge of MNOS structures is briefly discussed and is shown to be due to a direct tunneling of charge carriers from traps in the nitride into the semiconductor.
Keywords
Charge carrier processes; Conductors; Dielectrics and electrical insulation; Electron traps; Permittivity; Radiative recombination; Region 1; Spontaneous emission; Tunneling; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1972.17500
Filename
1476971
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