• DocumentCode
    1043315
  • Title

    Properties of MNOS structures

  • Author

    Lundström, K. Ingemar ; Svensson, Christer M.

  • Author_Institution
    Chalmers University of Technology, Gothenburg, Sweden
  • Volume
    19
  • Issue
    6
  • fYear
    1972
  • fDate
    6/1/1972 12:00:00 AM
  • Firstpage
    826
  • Lastpage
    836
  • Abstract
    The properties of thin oxide MNOS structures are studied. An analytical theory for the switching time constant is derived and curves of the switching time constant versus the nitride field are computed. These curves are useful in the design of MNOS-memory transistors. The theory is compared with experiments. The normal current in the thin oxide MNOS structures is assumed to be a modified Fowler-Nordheim current. At small oxide thicknesses and low nitride field, an additional current is shown to exist that is attributed to direct tunneling into traps in the nitride. The discharge of MNOS structures is briefly discussed and is shown to be due to a direct tunneling of charge carriers from traps in the nitride into the semiconductor.
  • Keywords
    Charge carrier processes; Conductors; Dielectrics and electrical insulation; Electron traps; Permittivity; Radiative recombination; Region 1; Spontaneous emission; Tunneling; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1972.17500
  • Filename
    1476971