DocumentCode
1043693
Title
Bulk and optical generation parameters measured with the pulsed MOS capacitor
Author
Schroder, Dieter K.
Author_Institution
Westinghouse Research Laboratories, Pittsburgh, Pa.
Volume
19
Issue
9
fYear
1972
fDate
9/1/1972 12:00:00 AM
Firstpage
1018
Lastpage
1023
Abstract
Theory and experiments are presented for the pulsed MOS capacitor when carrier generation is constant. This condition obtains when quasi-neutral bulk-region generation dominates over that in the space-charge region or when generation is due to an external excitation mechanism. It is shown how the diffusion length, surface generation velocity, and external flux can be obtained from the pulsed
response. This extends the usefulness of the pulsed MOS-C to narrow-gap semiconductors, such as germanium, as well as to optical generation measurements.
response. This extends the usefulness of the pulsed MOS-C to narrow-gap semiconductors, such as germanium, as well as to optical generation measurements.Keywords
Capacitance; Germanium; Helium; MOS capacitors; Optical pulse generation; Optical pulses; Pulse measurements; Silicon devices; Temperature; Velocity measurement;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1972.17538
Filename
1477009
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