DocumentCode :
1043693
Title :
Bulk and optical generation parameters measured with the pulsed MOS capacitor
Author :
Schroder, Dieter K.
Author_Institution :
Westinghouse Research Laboratories, Pittsburgh, Pa.
Volume :
19
Issue :
9
fYear :
1972
fDate :
9/1/1972 12:00:00 AM
Firstpage :
1018
Lastpage :
1023
Abstract :
Theory and experiments are presented for the pulsed MOS capacitor when carrier generation is constant. This condition obtains when quasi-neutral bulk-region generation dominates over that in the space-charge region or when generation is due to an external excitation mechanism. It is shown how the diffusion length, surface generation velocity, and external flux can be obtained from the pulsed C-i response. This extends the usefulness of the pulsed MOS-C to narrow-gap semiconductors, such as germanium, as well as to optical generation measurements.
Keywords :
Capacitance; Germanium; Helium; MOS capacitors; Optical pulse generation; Optical pulses; Pulse measurements; Silicon devices; Temperature; Velocity measurement;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1972.17538
Filename :
1477009
Link To Document :
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