DocumentCode :
1044052
Title :
Simple technologies for fabrication of low-loss silica waveguides
Author :
Lai, Q. ; Gu, J.S. ; Smit, M.K. ; Schmid, J. ; Melchior, H.
Author_Institution :
Inst. of Quantum Electron., Swiss Federal Inst. of Technol. Zurich, Switzerland
Volume :
28
Issue :
11
fYear :
1992
fDate :
5/21/1992 12:00:00 AM
Firstpage :
1000
Lastpage :
1001
Abstract :
A simple and reproducible technology is developed for the fabrication of low-loss silica waveguides on silicon substrates. The guiding layer is formed by changing the Si-O ratio composition of the SiO2 layer. The waveguides can be made to have a good match to either optical fibres or guided-wave devices in III-V compound semiconductors.
Keywords :
integrated optics; optical glass; optical waveguides; plasma CVD; silicon compounds; III-V compounds waveguide matching; Si substrates; Si-O ratio composition; SiO 2-Si; fabrication; glass; guiding layer; low-loss optical waveguides; low-loss silica waveguides; optical fibre matching; refractive index control; reproducible technology;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19920635
Filename :
274685
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1044052
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