DocumentCode
1044218
Title
Subthreshold and above threshold gate current in heterostructure insulated gate field-effect transistors
Author
Schuermeyer, F. ; Martinez, E. ; Shur, M. ; Grider, David ; Nohava, J.
Author_Institution
Wright Lab., Wright Patterson AFB, OH, USA
Volume
28
Issue
11
fYear
1992
fDate
5/21/1992 12:00:00 AM
Firstpage
1024
Lastpage
1026
Abstract
Experimental data are presented which show that the gate current at zero drain bias in HIGFETs changes qualitatively when the gate voltage is varied from below to above threshold. Above threshold, the gate current flows from the entire channel, and below threshold, the gate current flows from the gate edges. A new independent method for deducing threshold old voltage is introduced.
Keywords
insulated gate field effect transistors; leakage currents; 0.6 to 1 micron; AlGaAs-GaAs; HIGFETs; above threshold gate current; gate length; gate voltage; heterostructure insulated gate field-effect transistors; subthreshold gate current; threshold old voltage; zero drain bias;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19920650
Filename
274700
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