DocumentCode :
1044303
Title :
Computer analysis on the static negative resistance due to the geometrical effect of a GaAs bulk element
Author :
Tomizawa, Kazutaka ; Tateno, Hiroshi ; Kataoka, Shoei
Author_Institution :
Meiji University, Tokyo, Japan
Volume :
19
Issue :
12
fYear :
1972
fDate :
12/1/1972 12:00:00 AM
Firstpage :
1299
Lastpage :
1300
Abstract :
Results of computer analysis on the static negative resistance of a GaAs bulk element with a geometrical effect are presented. It is shown that a static negative resistance appears across an overcritically doped GaAs element with a geometry of expanding cross section toward the anode as a result of the development of a stationary high-field domain at the expanding part of the element. These results are in good agreement with the reported experimental results.
Keywords :
Anodes; Cathodes; Doping; Electrons; Gallium arsenide; Geometry; Gunn devices; Semiconductor diodes; Semiconductor process modeling; Threshold voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1972.17597
Filename :
1477068
Link To Document :
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