• DocumentCode
    1044963
  • Title

    A simple analysis of the stable field profile in the supercritical TEA

  • Author

    Jeppesen, Palle ; Jeppsson, Bert I.

  • Author_Institution
    Technical University of Denmark, Lyngby, Denmark
  • Volume
    20
  • Issue
    4
  • fYear
    1973
  • fDate
    4/1/1973 12:00:00 AM
  • Firstpage
    371
  • Lastpage
    379
  • Abstract
    An analytical investigation supported by numerical calculations has been performed of the stable field profile in a supercritical diffusion-stabilized n-GaAs transferred electron amplifier (TEA) with ohmic contacts. In the numerical analysis, the field profile is determined by solving the steady-state continuity and Poisson equations. The diffusion-induced short-circuit stability is checked by performing time-domain computer simulations under constant voltage conditions. The analytical analysis based on simplifying assumptions gives the following results in good agreement with the numerical results. 1) A minimum doping level required for stability exists, which is inversely proportional to the field-independent diffusion coefficient assumed in the simple analysis. 2) The dc current is bias independent and below the threshold value, and the current drop ratio increases slowly and almost linearly with the doping level. 3) The domain width normalized to the diode length L varies almost linearly with (V_{B}/V_{T}-1)^{frac{1}{2}}/(n_{0}L)^{frac{1}{2}} where VBis the bias voltage VTis the threshold voltage, and no is the doping level. 4) The peak domain field varies almost linearly with ( V_{B}/V_{T}-1 )^{frac{1}{2}} ( n_{0}L)^{frac{1}{2}} . Those results contribute to the understanding of the high n_{0}L -product switch and the stability of the supercritical TEA.
  • Keywords
    Doping; Electrons; Numerical analysis; Numerical stability; Ohmic contacts; Performance analysis; Poisson equations; Steady-state; Switches; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1973.17658
  • Filename
    1477315