The influence of carrier generation within the space-charge regions of silicon p-n junctions upon their breakdown characteristics is analyzed. Universal plots for the calculation of the total multiplication in one-sided silicon junctions versus voltage and substrate concentration are given, which take into account both injection and generation of initiating carriers. It is shown that the multiplication factor

of practical (i.e., generation-dominated) silicon junctions differs from the pure hole-pure electron multiplication factors M
pand M
nand ranges between them, i.e.,

. Its calculated voltage dependence is well approximated by Miller\´s relationship with an exponent

between 4 and 7 for impurity concentrations in the substrate between 10
14and 10
17cm
-3.