Title :
High-Performance Transparent AZO TFTs Fabricated on Glass Substrate
Author :
Jian Cai ; Dedong Han ; Youfeng Geng ; Wei Wang ; Liangliang Wang ; Shengdong Zhang ; Yi Wang
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
Abstract :
High-performance transparent low-temperature top-gate type aluminum doped zinc oxide (AZO) thin-film transistors (TFTs) (W/L=100 or 10 μm) are successfully fabricated on glass substrate. All the process temperature is below 100°C. For VG=-2 to 5 V, the TFTs using sputtering deposit AZO layer at room temperature as channel layer exhibits excellent properties, such as a saturation mobility μs of 285 cm2/V·s, a linear field effect mobility μl of 143 cm2/V·s, a threshold voltage Vth of 0.9 V, a steep subthreshold swing of 108 mV/decade, a low off-state current value Ioff of 5×10-13 A, a high ON/OFF ratio of 2×109 and a high transmittance of 82.5%. The results highlight that excellent device performance can be realized in AZO TFTs. Note that this is the best performance of AZO TFT ever reported.
Keywords :
sputter deposition; substrates; thin film transistors; channel layer; glass substrate; high performance transparent AZO TFT; linear field effect mobility; low off state current value; process temperature; room temperature; saturation mobility; sputtering deposit AZO layer; subthreshold swing; thin film transistors; threshold voltage; transparent low temperature top gate type aluminum doped zinc oxide; voltage -2 V to 5 V; Aluminum doped zinc oxide (AZO); high performance; low temperature process; thin-film transistor (TFT);
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2013.2264319