Title :
The importance of mask alignment on the orientation dependent etching of silicon and applications
fDate :
12/1/1973 12:00:00 AM
Keywords :
Charge carrier processes; Current measurement; Etching; Magnetic fields; Magnetic switching; Plasma measurements; Silicon; Superconductivity; Switches; Time measurement;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1973.17844
