A new patterning process concept for large-area transistor circuit fabrication without using an optical mask aligner

Author

Mikami, Yuya ; Nagae, Y. ; Mori, Yuji ; Kuwabara, Kazuhiro ; Saito, Takashi ; Hayama, Hirofumi ; Asada, Hideaki ; Akimoto, Youhei ; Kobayashi, Masayoshi ; Okazaki, Shun ; Asaka, Kota ; Matsui, Hiroyuki ; Nakamura, Kazunori ; Kaneko, Eiji

Author_Institution

Giant Electron. Res. Lab., GTC Corp., Tokyo, Japan

Volume

41

Issue

3

fYear

1994

fDate

3/1/1994 12:00:00 AM

Firstpage

306

Lastpage

314

Abstract

A new concept to produce large thin film transistor liquid crystal displays (TFT-LCD´s) without using an optical mask aligner is proposed which emphasizes patterning technology. Some experimental thin film transistors (TFT´s) are fabricated according to the concept and operated like conventional transistors fabricated by using an optical mask aligner. The concept includes improvement of printing technology and development of a double-layer resist method. The latter method employs a printed ink pattern and a photoresist. This prevents contamination of thin films by metal impurities which affect electrical characteristics of the TFT´s. A special gravure offset printing technology is proposed, composed of a large thixotropy valued UV ink, and a fine, precision etched glass intaglio. The experimental TFT´s, with a designed minimum gate length of 10 μm, have comparable electric characteristics to those of conventional poly-Si TFT´s

Keywords

high definition television; liquid crystal displays; photoresists; screens (display); thin film transistors; TFT-LCD´s; double-layer resist method; electric characteristics; electrical characteristics; gravure offset printing technology; large thin film transistor liquid crystal displays; large thixotropy valued UV ink; large-area transistor circuit fabrication; metal impurities; minimum gate length; optical mask aligner; patterning process; patterning technology; photoresist; precision etched glass intaglio; printed ink pattern; printing technology; Circuits; Contamination; Electric variables; Impurities; Ink; Liquid crystal displays; Optical films; Printing; Resists; Thin film transistors;

fLanguage

English

Journal_Title

Electron Devices, IEEE Transactions on

Publisher

ieee

ISSN

0018-9383

Type

jour

DOI

10.1109/16.275214

Filename

275214