DocumentCode :
1047541
Title :
Final stage of the charge-transfer process in charge-coupled devices
Author :
Daimon, Yoshiaki ; Mohsen, Amr M. ; McGill, T.C.
Author_Institution :
California Institute of Technology, Pasadena, Calif.
Volume :
21
Issue :
4
fYear :
1974
fDate :
4/1/1974 12:00:00 AM
Firstpage :
266
Lastpage :
272
Abstract :
The final stages of transfer of charge from under a storage gate is formulated analytically including both fringing-field induced drift and diffusion. Analytic solutions to these equations are presented for constant fringing fields, and a system of equations for spatially varying fields is developed. Approximate solutions for spatially varying fringing fields, when combined with a lumped-parameter model of the self-induced field effects, are shown to give a reasonably accurate representation of the free-charge transfer process.
Keywords :
Boundary conditions; Charge coupled devices; Charge transfer; Diffusion processes; Electrodes; Equations; Insulation; Laboratories; Numerical simulation; Shape;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1974.17908
Filename :
1477723
Link To Document :
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